Dr. Bingan Chen
Biography
Company Profile
Naso Tech
Company Profile
Naso Tech founded in 2018, has been focused on designing and manufacturing high-end equipment for advanced materials. Our core team members are from University of Cambridge and well- known industry firms, who bring strong and wealth of expertise to the company.
We are experienced in the field of advanced semiconductor manufacturing equipment, including chemical vapor deposition (CVD), metal organic chemical vapor deposition (MOCVD), Atomic Layer Deposition(ALD) and ETCH(etching).
Product & Service
CVD:NASO TECH’s SiC Epitaxial Reactor is a specialized equipment designed for the epitaxial layer growth—a core process in silicon carbide chip production. This step is critical for manufacturing diodes and power semiconductor devices.
PVD:NASO TECH’s PVD Equipment primarily deposits various metallic and non-metallic thin films on wafer surfaces during semiconductor fabrication. It plays a key role in forming essential conductive pathways, electrode contacts, and protective barriers or integrated circuits.
ALD:NASO TECH’s ALD System is used in perovskite solar cell manufacturing for depositing high-quality functional layers with extreme uniformity and conformity—such as electron transport layers (ETL) and interface passivation layers. It addresses critical challenges in cell stability and efficienc.
